专利名称：PLASMA SOURCE AND METHODS FOR
DEPOSITING THIN FILM COATINGS USINGPLASMA ENHANCED CHEMICAL VAPORDEPOSITION
发明人：Peter MASCHWITZ申请号：US14148606申请日：20140106
公开号：US20140216343A1公开日：20140807
专利附图：
摘要：The present invention provides novel plasma sources useful in the thin film
coating arts and methods of using the same. More specifically, the present inventionprovides novel linear and two dimensional plasma sources that produce linear and twodimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapordeposition. The present invention also provides methods of making thin film coatings andmethods of increasing the coating efficiencies of such methods.
申请人：AGC Flat Glass North America, Inc.,AGC Glass Europe,Asahi Glass Co., Ltd.
地址：Alpharetta GA US,Brussels BE,Tokyo JP
国籍：US,BE,JP
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